|ZYGO SELLS NEW DEFECT PRINTABILITY SYSTEM TO SEMATECH|
MIDDLEFIELD, CONNECTICUT (March 22, 1999)......Zygo Corporation (NASDAQ:ZIGO) announced today that International Sematech has purchased its new DPS-310 system. The recently introduced DPS Series of inspection/review tools incorporates TINT Virtual Stepper Mask Defect Analysis software which enables customers to examine a photomask and ascertain whether a defect detected during the mask certification process will actually "print" on the wafer, without having to actually test print and inspect wafers. Customers will be able to identify nuisance OPC-induced defects detected by automatic inspection systems, and determine the impact of mask defects upon process windows and CD control.
The DPS-310 will be delivered to RAVE LLC., an advanced reticle repair tool manufacturer being sponsored by International Sematech to develop the next generation repair tool. This system will be used to verify that the photomask repairs are successful and will not be printed on the wafers.
The TINT Virtual Stepper, combined with the ZYGO Advanced Imaging Systems' family of AMS/KMS Metrology tools, offers a one-instrument, total solution for the off-line review and analysis of defects in advanced photomasks.
Zygo Corporation designs, develops, manufactures, and markets high performance measurement and yield improvement instruments, custom automation systems, and accessories used in high technology industries. The Company is headquartered in Middlefield, Connecticut, and also has operations in Asslar, Germany; Longmont, Colorado; and sales offices throughout the world. ZYGO is traded on the Nasdaq National Market under the symbol ZIGO. Additional information on the Company is available on the Internet at www.zygo.com.
This press release may contain forward-looking statements within the meaning of Section 27A of the Securities Act of 1933, as amended, and Section 21E of the Securities Exchange Act of 1934, as amended, which reflect the Company's current judgment on certain issues. Because such statements apply to future events, they are subject to risks and uncertainties that could cause the actual results to differ materially. Important factors which could cause actual results to differ materially are described in the Company's reports on Form 10-K and 10-Q on file with the Securities and Exchange Commission.
|New-Tech||05/29 - 05/30|
|Euspen||06/04 - 06/08|
|Synchotron Rad...||06/10 - 06/15|
|Astro. Tel. & Inst.||06/12 - 06/14|
|SEMICON West||07/10 - 07/12|
|Microscopy & ...||08/06 - 08/09|
|(Click for a complete list)|