Mirrors
ZYGO creates precision optical mirrors using stringently-controlled fabrication processes, enabling them to function reliably in a variety of extreme environments. Our mirrors are found underwater, in deserts, at high altitudes and orbiting the earth. We customize every mirror to meet or exceed your requirements.
Mirrors can also be light-weighted for applications where weight is critical, as is common in aerospace applications. Light-weighting is a process in which material is removed from an optical component by machining, or other methods, while still preserving the mirror's optical performance.
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Key Features
- Geometry (flats, spheres, aspheres) to better than λ/50 PV.
- Full aperture interferometry up to 32" for flats, and up to 12" for spheres/aspheres (larger with stitching).
- Surface Roughness < 1 nm rms.
Applications
ZYGO has a long tradition of manufacturing custom-made optical mirrors for a wide variety of applications, including, but not limited to:
- EUV mirrors
- Lightweighted mirrors
- Space mirrors
- Stage Components for lithographic steppers
- X-ray mirrors
- Defense/Aerospace
- Medical/Life Sciences
- Industrial OEM
- Intelligence, surveillance & reconnaissance (ISR)
Title4 Big Mistakes in Developing Photonics-Enabled Medical Devices
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TitleBound-abrasive polishers for optical glass
TitleCoating High Quality Custom Optics: Risk Reduction Through Supplier Evaluation
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4 Big Mistakes in Developing Photonics-Enabled Medical Devices
DocumentTechnical Paper
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A Technique to Control Global Figure Using Acid Immersion and Zernike Decomposition
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Application of precision diamond machining to the manufacture of microphotonics components
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Coating High Quality Custom Optics: Risk Reduction Through Supplier Evaluation
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Combined advanced finishing and UV-laser conditioning for producing UV-damage-resistant fused-silica optics
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Computer control and process monitoring of electrolytic in-process dressing of metal bond fine diamond wheels for NIF optics
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Modern Optics Drawings: The journey from MIL to ANSI to ISO drawing formats
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Projection Optics for Extreme Ultraviolet Lithography (EUVL) Micro-field Exposure Tools (METs) with a Numerical Aperture of 0.5
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