Spherical Elements
ZYGO's Optics business segment manufactures precision spheres and lenses ranging in diameter from 50 mm to 700 mm with radii from 12.7 mm to 8 meters.
Our standard product line of transmission spheres is available in 100 and 150 mm clear apertures ranging in f-numbers from f/.65 to f/11 with wavefront errors of λ/10 or λ/20. Our new line of Ultrasphere™ transmission spheres is available at λ/40. Various convergers and divergers are also part of our standard product line. We are a qualified vendor for high laser fluence lenses.
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Key Features
- Specializing in lenses up to 700 mm diameter.
- Surfaces verified and radii measured using ZYGO interferometry.
- Surface figure better than λ/20 available.
The Way Ahead When Commercializing Space Optics
A Technique to Control Global Figure Using Acid Immersion and Zernike Decomposition
Application of precision diamond machining to the manufacture of microphotonics components
Bound-abrasive polishers for optical glass
Coating High Quality Custom Optics: Risk Reduction Through Supplier Evaluation
Combined advanced finishing and UV-laser conditioning for producing UV-damage-resistant fused-silica optics
Computer control and process monitoring of electrolytic in-process dressing of metal bond fine diamond wheels for NIF optics
Fun facts about pitch and the pitfalls of ignorance
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A Technique to Control Global Figure Using Acid Immersion and Zernike Decomposition
DocumentTechnical Paper
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Application of precision diamond machining to the manufacture of microphotonics components
DocumentTechnical Paper
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Coating High Quality Custom Optics: Risk Reduction Through Supplier Evaluation
DocumentTechnical Paper
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Combined advanced finishing and UV-laser conditioning for producing UV-damage-resistant fused-silica optics
DocumentTechnical Paper
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Computer control and process monitoring of electrolytic in-process dressing of metal bond fine diamond wheels for NIF optics
DocumentTechnical Paper
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Modern Optics Drawings: The journey from MIL to ANSI to ISO drawing formats
DocumentTechnical Paper
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Projection Optics for Extreme Ultraviolet Lithography (EUVL) Micro-field Exposure Tools (METs) with a Numerical Aperture of 0.5
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